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PECVD SYSTEM

  • PECVD is one of the chemical vapor deposition methods that mix and inject various reactive gases after evacuation and then activate the reactive gases using plasma to cause a desired chemical reaction on the substrate and form a thin film thereon. It is a general-purpose equipment used in the semiconductor manufacturing process.
  • CVD types include Thermal CVD, Plasma Enhanced CVD, Microwave CVD, Laser CVD, and MOCVD (Metal Organic CVD).