The RTA rapid vacuum heat treatment furnace is an equipment capable of rapid heat treatment by rapidly raising the surface temperature of the specimen to a high temperature using a halogen heater.
To increase reflection efficiency, the reflector is coated with Au, and nitrogen gas, etc. can be constantly flowed using MFC to create a gas atmosphere for RTA.
In general, RTA is used for annealing after coating of electrode materials for electrical property analysis of semiconductor materials or for observing crystal changes by changing the heat treatment conditions of amorphous silicon in the TFT field.
