HOME PRODUCTS

MINISERIES

PLASMA TREATMENT SYSTEM

  • Simple connection to existing vacuum exhaust devices or other equipment
  • Compact design, put it on the desk and use it (Plasma treatment, Ashing, Etching…..)
  • The supplied gas is ionized and collided with the sample surface to change the surface modification.
  • ₩ 2,600,000

SPECIFICATION

PLASMA SOURCE 2.45 GHz 700W
SUBSTRATE SIZE 70 x 70 mm (water cool)
GAS LINE (MFC OPTION) METERING ONE LINE (Ar ,O2, N2,CF4…etc)
VACUUM PUMPING PORT NW25
DIMENSIONS W500 x D515 x H490

※ Move left and right to check the contents.